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漢民微測自成立於 1998 年以來就致力於研發最先進的電子束檢測技術來協助提升半導體產業之良率。目前漢民微測已經成為世界各大晶圓代工廠與晶圓記憶體廠最大的電子束檢測設備供應商。我們擁有自行研發專利的電子槍技術 、 電子束成像技術與精準的檢測軟體 ， 來確保我們的每條產品線-eScan® 系 列、ePTM 系 列、eXplore®系列皆能滿足半導體研發部門與量產單位之各項應用。 |
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漢民微測致力於開發出最先進的技術來滿足目前及未來的半導體產業需求。我們不只設計與製造最好的設備，
還緊密地與客戶共同合作讓我們的技術發揮最大的價值，並且發展出半導體產業最佳生產力的漢民微測檢測設
備。客戶滿意永遠是我們最重視的服務。 |
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65_nm_Photolithography_Process_Window_Qualification_Study_with_Advanced_e-beam_Metrology_and_Inspection_Systems,Proceedings_of_the_SPIE,Volume_6152,pp.1470-1479(2006)
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After_Development_Inspection(ADI)_Studies_of_Photo_Resist_Defectivity_of_an_Advanced_Memory_Device
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1135.38 KB
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Contact_leakage_and_open_monitoring_with_an_advanced_e-beam_inspection_system,Proceedings_of_the_SPIE,Volume6518,pp.65184I(2007)
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743.76 KB
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Effects_of_WCMP_Process_on_Surface_Charging_Mode_of_Electron_Beam_Inspection,International_Symposium_Semiconductor_Manufacturing_2006
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1354.07 KB
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Enhancement_of_Voltage_Contrast_Inspection_Signal_Using_Scan_Direction,International_Symposium_Semiconductor_Manufacturing_2007
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1358.6 KB
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Enhancing_Thin_Dielectric_Remaining_Detection_Under_Polysilico_Plug_of_Advanced_DRAM_by_Electron_Beam_Inspection,International_Symposium_Semiconductor_Manufacturing_2007
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2329.45 KB
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EUV_mask_pattern_inspection_with_an_advanced_electron_beam_inspection_system,Proceedings_Vol.7520,_Lithography_Asia_2009
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2471.82 KB
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High-throughput_Contact_Critical_Dimension_and_Gray_Level_Value_Measurement,Proceedings_of_the_SPIE,_Volume6152,pp.1171-1177(2006)
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511.11 KB
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In-line_Semi-electrical_Process_Diagnosis_Methodology_for_Integrated_Process_Window_Optimization_of_65nm_and_below_Technology_Nodes,Proceedings_of_the_SPIE,Volume6152,pp.642-649(2006)
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416.49 KB
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Inspection_and_Repair_for_Imprint_Lithography_at_32nm_and_below,Proceedings_of_the_SPIE,Volume7379(2009).,pp.73790N-73790N-12(2009)
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