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漢民微測自成立於 1998 年以來就致力於研發最先進的電子束檢測技術來協助提升半導體產業之良率。目前漢民微測已經成為世界各大晶圓代工廠與晶圓記憶體廠最大的電子束檢測設備供應商。我們擁有自行研發專利的電子槍技術 、 電子束成像技術與精準的檢測軟體 ， 來確保我們的每條產品線-eScan® 系 列、ePTM 系 列、eXplore®系列皆能滿足半導體研發部門與量產單位之各項應用。 |
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Description :
eXplore® is the first e-beam inspection system specially designed for mask manufacturers to inspect physical defect of EUV mask and nano-imprint template. eXplore® offers the highest inspection resolution of the mask defects. With its unique self-adjusting charge control capability, it can effectively inspect NIL masks directly. It can be used to quickly drive down the defectivity of the mask R&D by capturing the tiny defects that optical mask inspection cannot capture.
Value Proposition : |
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| eXplore® Series |
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 A mask EBI system with the highest sensitivity to DOI ( defect of  interest ) signature detection. |
A mask EBI system with the lowest CoO.
A mask EBI system that can be a golden tool for the mask maker to baseline other inspection systems. |
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Applications :
eManager™ is capable to accurately classifying the defects captured by eXplore®. For nano-imprint template, it can be applied for all the three patterning steps : Cr hard mask AEI, QZ AEI with Cr hard mask, and QZ pattern after Cr hard mask removal. For EUV mask inspection, eXplore® is used to capture pattern defects after absorber etch. |
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