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Established in 1998, Hermes Microvision Inc.(HMI) has been committed to the research and development of the most advanced E-beam Inspection (EBI) tools and solutions for the leading semiconductor manufacturing fabs. Today, HMI is the leading supplier of EBI tools for both foundry and memory fabs worldwide. Based on our proprietary electron gun and column technologies and highly effective defect inspection algorithms, we deliver multiple product lines, including eScan® Series / ePTM Series / eXplore® Series, for various R&D and production applications.
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Description :
eXplore® is the first e-beam inspection system specially designed for mask manufacturers to inspect physical defect of EUV mask and nano-imprint template. eXplore® offers the highest inspection resolution of the mask defects. With its unique self-adjusting charge control capability, it can effectively inspect NIL masks directly. It can be used to quickly drive down the defectivity of the mask R&D by capturing the tiny defects that optical mask inspection cannot capture.
Value Proposition : |
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| eXplore® Series |
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 A mask EBI system with the highest sensitivity to DOI ( defect of  interest ) signature detection.
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A mask EBI system with the lowest CoO.
A mask EBI system that can be a golden tool for the mask maker to baseline other inspection systems.
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Applications :
eManager™ is capable to accurately classifying the defects captured by eXplore®. For nano-imprint template, it can be applied for all the three patterning steps : Cr hard mask AEI, QZ AEI with Cr hard mask, and QZ pattern after Cr hard mask removal. For EUV mask inspection, eXplore® is used to capture pattern defects after absorber etch. |
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